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Plasma Reactor for Depositing Thin Polymer Films
1995-1996 Working in cooperation with the CSIRO and Monash Univeristy, the CEO of NVTech designed and had constructed, by the Ian Wark laboratories, a prototype Plasma Reactor for the purpose of depositing ultra-thin, contiguous layers of polymer. He conceived a means of mass producing an ultra-thin temperature stable capacitor utilising hexa-methyl-disiloxane as the dielectric. This work led onto the means of creating armour plate from microlayers of polymer and amorphous diamond. Because the resultant polymers are hyper-cross-linked, the process also has potential for the creation of super micro-fibres for use in highly specialised textiles.